Preparation, thermal stability and electrical transport properties of vaesite, NiS2

C2TN, Departamento de Engenharia e Ciências Nucleares, Instituto Superior Técnico, Universidade de Lisboa, Bobadela, Portugal
CFisUC, Departamento de Física, Universidade de Coimbra, Coimbra, Portugal
CQE, Departamento de Engenharia Química, Instituto Superior Técnico, Universidade de Lisboa, Lisboa, Portugal
CERENA, Departamento de Engenharia Civil Arquitectura e Georrecursos, Instituto Superior Técnico, Universidade de Lisboa, Lisboa, Portugal
DOI
10.7287/peerj.preprints.27825v1
Subject Areas
Ceramics, Electronic, Optical and Magnetic, Energy Materials, Semiconductors
Keywords
Vaesite, Chalcogenide, Hot-press, Density Functional Theory, Semiconductor, Thermoelectric
Copyright
© 2019 Ferreira et al.
Licence
This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, reproduction and adaptation in any medium and for any purpose provided that it is properly attributed. For attribution, the original author(s), title, publication source (PeerJ Preprints) and either DOI or URL of the article must be cited.
Cite this article
Ferreira HM, Lopes EB, Malta JF, Ferreira LM, Casimiro MH, Santos L, Pereira MF, Pereira Gonçalves A. 2019. Preparation, thermal stability and electrical transport properties of vaesite, NiS2. PeerJ Preprints 7:e27825v1

Abstract

Vaesite, a nickel chalcogenide with NiS2 formula, has been synthetized and studied by theoretical and experimental methods. NiS2 was prepared by solid-state reaction under vacuum and densified by hot-pressing, at different consolidation conditions. Dense single-phase pellets (relative densities >94%) were obtained, without significant lattice distortions for different hot-pressing conditions. The thermal stability of NiS2 was studied by thermogravimetric analysis. Both as-synthetized and hot-pressed NiS2 have a single phase nature, although some hot-pressed samples had traces of the sulfur deficient phase, Ni1-xS (<1%vol), due to the strong desulfurization at T > 340ºC. The electronic band structure and density of states were calculated by Density Functional Theory (DFT), indicating a metallic behavior. However, the electronic transport measurements showed p-type semiconductivity for bulk NiS2, verifying its characteristic behavior has a Mott insulator. The consolidation conditions strongly influence the electronic properties, with the best room-temperature Seebeck coefficient, electrical resistivity and power factor being 182µVK-1, 2257μΩm and 14.1µWK-2m-1, respectively, pointing this compound as a good starting point for a new family of thermoelectric materials.

Author Comment

This is a submission to PeerJ Materials Science for review.

Supplemental Information

Powder X-ray diffraction data of the NiS2 material hot-pressed at 750ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-1

Powder X-ray diffraction data of the NiS2 material hot-pressed at 720ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-2

Powder X-ray diffraction data of the NiS2 material hot-pressed at 700ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-3

Powder X-ray diffraction data of the NiS2 as-synthesized material

DOI: 10.7287/peerj.preprints.27825v1/supp-4

Thermogravimetric analysis results of the NiS2 material hot-pressed at 720ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-5

Thermogravimetric analysis results of the NiS2 as-synthesized material

DOI: 10.7287/peerj.preprints.27825v1/supp-6

Raman spectrum of the NiS2 material hot-pressed at 720ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-7

Porosity analysis results of the NiS2 materials

DOI: 10.7287/peerj.preprints.27825v1/supp-8

Apparent density results of the NiS2 materials

DOI: 10.7287/peerj.preprints.27825v1/supp-9

Cell parameters calculation for the NiS2 as-synthesized material

DOI: 10.7287/peerj.preprints.27825v1/supp-10

Cell parameters calculation for the NiS2 material hot-pressed at 750ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-11

Cell parameters calculation for the NiS2 material hot-pressed at 720ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-12

Cell parameters calculation for the NiS2 material hot-pressed at 700ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-13

EDS results of the NiS2 material hot-pressed at 700ºC and 56 MPa for 1.5 h (area 1)

DOI: 10.7287/peerj.preprints.27825v1/supp-14

EDS results of the NiS2 material hot-pressed at 700ºC and 56 MPa for 1.5 h (area 2)

DOI: 10.7287/peerj.preprints.27825v1/supp-15

EDS results of the NiS2 material hot-pressed at 700ºC and 56 MPa for 1.5 h (area 3)

DOI: 10.7287/peerj.preprints.27825v1/supp-16

EDS results of the NiS2 material hot-pressed at 720ºC and 56 MPa for 1.5 h (area 1)

DOI: 10.7287/peerj.preprints.27825v1/supp-17

EDS results of the NiS2 material hot-pressed at 720ºC and 56 MPa for 1.5 h (area 2)

DOI: 10.7287/peerj.preprints.27825v1/supp-18

EDS results of the NiS2 material hot-pressed at 720ºC and 56 MPa for 1.5 h (area 3)

DOI: 10.7287/peerj.preprints.27825v1/supp-19

EDS results of the NiS2 material hot-pressed at 750ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-20

Seebeck coefficient data of the NiS2 material hot-pressed at 700ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-21

Seebeck coefficient data of the NiS2 material hot-pressed at 720ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-22

Seebeck coefficient data of the NiS2 material hot-pressed at 750ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-23

Electrical resistivity data of the NiS2 material hot-pressed at 700ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-24

Electrical resistivity data of the NiS2 material hot-pressed at 720ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-25

Electrical resistivity data of the NiS2 material hot-pressed at 750ºC and 56 MPa for 1.5 h

DOI: 10.7287/peerj.preprints.27825v1/supp-26